| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a wafer phase register mechanism which can surely perform the posture register, without horizontal displacement in its attitude register process and also without a sliding section and is superior in maintainability, in a substrate processor. SOLUTION: In a substrate processor which possesses a wafer phase register mechanism for registering the phase of the wafer 6 within a wafer cassette, a notch register roller 21 smaller than a notch 8 of a wafer is arranged capable of abutment on the wafer, under the wafer stored in the wafer cassette, and the phase of the wafer 6 is registered by the rotation of the notch register roller 21, and the wafer 6 rotates by rotating the notch register roller 21, and the notch is positioned by rib fitting in the notch, and also the notch register roller 21 separates from the wafer 6.</p> |
