| 摘要 |
<p>A method for processing a diaphragm plate of, e.g., an electron microscope, comprising a cleaning step of cleaning the residual resist on a diaphragm plate in which a hole is made by etching with hot concentrated sulfuric acid or a hot aqueous solution of hydrogen peroxide and a coating step of coating the diaphragm plate with osmium. The residual resist can be more completely removed than conventional. As a result, the problems such as the charging, contamination, and separation of the coating are suppressed, and the resolution is improved. The osmium coating comes to serve as a hard noncrystalline conductive film, thereby preventing degradation of the resolution.</p> |
