| 摘要 |
PROBLEM TO BE SOLVED: To prevent a polishing pad from deteriorating in stability of polishing characteristic by a method wherein the polishing pad is equipped with a polishing layer of syntactic foam that contains conductive corpuscles. SOLUTION: A polishing layer of syntactic foam can be used together with a cushioning layer to serve as one layer out of a two-layered structure, where the polishing layer of syntactic foam is provided in the polishing platen of a polishing machine through the intermediary of the cushioning layer that is used for following the undulations of a semiconductor wafer when a semiconductor wafer is polished. Syntactic foam is formed through a manner where hollow corpuscles of glass, plastic material or the like are dispersed in a plastic matrix. Various kinds of material can be used as a plastic matrix, for instance, thermosetting resin such as an epoxy resin, an unsaturated polyester, a phenolic resin, a polyurethane, silicone, addition polymer such as a polyethylene, a polystyrene, a polyvinyl chloride, and thermoplastic resin such as a polyester represented by a polyethylene terephthalate, a polyamide represented by nylon 6, nylon 66 can be used as a plastic matrix. |
