发明名称 |
Method for optimizing printing of a phase shift mask having a phase shift error |
摘要 |
Optimizing printing of an image from an alternating phase shifting mask having a phase shift error is accomplished using off-axis illumination. By simulating the image using varying off-axis illumination parameters, optimized parameters are selected to compensate for the phase shift error. Once the off-axis illumination parameters are optimized, the image is shot. In addition, the method of varying off-axis illumination parameters to compensate for a phase shift error permits an alternating phase shifting mask to be shot at two different wavelengths.
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申请公布号 |
US6096457(A) |
申请公布日期 |
2000.08.01 |
申请号 |
US19980031639 |
申请日期 |
1998.02.27 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
PIERRAT, CHRISTOPHE;JENG NANSENG |
分类号 |
G03F1/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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