发明名称 Method for optimizing printing of a phase shift mask having a phase shift error
摘要 Optimizing printing of an image from an alternating phase shifting mask having a phase shift error is accomplished using off-axis illumination. By simulating the image using varying off-axis illumination parameters, optimized parameters are selected to compensate for the phase shift error. Once the off-axis illumination parameters are optimized, the image is shot. In addition, the method of varying off-axis illumination parameters to compensate for a phase shift error permits an alternating phase shifting mask to be shot at two different wavelengths.
申请公布号 US6096457(A) 申请公布日期 2000.08.01
申请号 US19980031639 申请日期 1998.02.27
申请人 MICRON TECHNOLOGY, INC. 发明人 PIERRAT, CHRISTOPHE;JENG NANSENG
分类号 G03F1/00;(IPC1-7):G03F9/00 主分类号 G03F1/00
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