ALIGNER, DIFFUSE REFLECTION PLATE AND REFLECTION DISPLAY

摘要

PROBLEM TO BE SOLVED: To eliminate a connected part on a large type substrate by improving the shot system of an aligner. SOLUTION: An exposing operation is performed using the prescribed amount of energy through a mask 101 where periodic pattern is lithographed in the aligner. The transfer treatment of a periodic pattern 106 performed on the region of a photosensitive layer formed on a substrate 2 is considered as a shot, and the pattern 106 is transferred to the whole surface of the substrate 2 by repeating the shot while the region where pattern is transferred is being moved. The quantity of energy of one shot is divided into a plurality of shots, and a plurality of shots are performed while the transfer region is staggered integer times of the period of the pattern 106. In order to transfer the pattern 106 having the secondary period, a plurality of shots are performed while the transfer region is staggered in the diagonal direction of the rectangular substrate 2.