发明名称 PRODUCTION OF INTEGRATED CIRCUIT
摘要 PROBLEM TO BE SOLVED: To reduce step parts in an integrated circuit, to sufficiently cover the step parts in the integrated circuit and to provide the integrated circuit having a practically flat surface without performing chemical machine working. SOLUTION: In this production method of the integrated circuit, the step parts in the integrated circuit are reduced by providing a step for sticking a first conductive material layer 14 on a first inductive material layer 12 and a step for forming a first conductive pattern 15 by patterning the first conductive material layer 14. Next, a second inductive layer 16 is stuck on a part exposing the first conductive pattern 15 and the first inductive material layer 12. A flattening material layer 20 is applied and hardened on a second inductive material layer 14, so that the flattening material layer 20 can form a practically flat upper surface 22. Until only the previously selected quantity of materials is left on the first conductive pattern 15, a portion 28 of the flattening material layer 20 and the second inductive material layer 16 is removed in such a way that the practically flat upper surface is maintained.
申请公布号 JP2000208630(A) 申请公布日期 2000.07.28
申请号 JP20000000186 申请日期 2000.01.05
申请人 TRW INC 发明人 RAFI N ERUMADOJIAN;GEORGE L CARVER
分类号 H01L21/312;H01L21/768;H01L23/532;H01L39/24 主分类号 H01L21/312
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