发明名称 PHOTOMASK ADHERENT APPARATUS AT ADHERENT EXPOSURE APPARATUS AND ADHERENT METHOD THEREOF
摘要 PURPOSE: An adherent apparatus and method thereof are provided, which can stick to all faces of photomask quickly through controlling the exhaust pressure at the process of adherent photomask and exposure material as well as can prevent the bubble. CONSTITUTION: A adherent apparatus contains photomask, photomask support member and export member. The adherent method comprises : preventing movement compulsorily of photomask support member under the formation microgab between photomask and exposure materials in sealed cabin ; bending the photomask by discharging the air of the sealed cabin at the status of movement inhibition; sticking the photomask to exposure materials from the middle part; and extending contact area to the surroundings among process of returning to original formation of bent photomask.
申请公布号 KR20000048206(A) 申请公布日期 2000.07.25
申请号 KR19990058530 申请日期 1999.12.17
申请人 NSK LTD. 发明人 OKATANIHITAEKI;YOUSIDAMASASI;AIHARATOSIYUKI
分类号 G03F7/20 主分类号 G03F7/20
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