发明名称 |
Substrate platform for a semiconductor substrate during rapid high temperature processing and method of supporting a substrate |
摘要 |
A platform for processing a substrate includes a first member and a second member. The first member includes a first support surface for supporting the substrate during processing. The second member includes a second support surface, which supports the first member thereon, and a third support surface, which is adapted to be supported in a processing chamber. The first and second members are releasably coupled together in a manner which permits unrestrained relative thermal expansion of the two members and also of the substrate. The platform is suitable for use in a processing reactor which includes a heater housing and an outer reactor housing. The heater housing encloses a heater assembly and provides a surface for supporting the platform during processing. The reactor also includes a gas injector for injecting at least one processing gas into the processing chamber for deposition on the substrate.
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申请公布号 |
US6090212(A) |
申请公布日期 |
2000.07.18 |
申请号 |
US19970912242 |
申请日期 |
1997.08.15 |
申请人 |
MICRO C TECHNOLOGIES, INC. |
发明人 |
MAHAWILI, IMAD |
分类号 |
C23C16/458;C23C16/48;H01L21/00;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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