METHOD FOR FABRICATING MICRO LENS OF IMAGE SENSOR

摘要

PURPOSE: A method for fabricating a micro lens of an image sensor is provided to have high light transmittance with regard to a short wavelength of a visible ray. CONSTITUTION: In a method for fabricating a micro lens of an image sensor, a color filter array(1) is formed on a substrate which has related devices such as photo sensing devices. A resist is deposited on the color filter array(1), and is partially exposed by use of a reticle. A desired resist pattern is formed by removing an exposed portion of the resist. A photo-sensitizer of a non exposed portion is removed by exposing the resist pattern(2a) at light(5) having a wavelength band of an exposure wavelength plus or minus 300nm. A micro lens of a convex hemisphere is formed by flowing the resist pattern(2a).