| 摘要 |
PURPOSE: A method for manufacturing a liquid crystal display device is provided to prevent a galvanic effect between the connection wirings. CONSTITUTION: A method for manufacturing a liquid crystal display device includes four steps. At the first step, a transistor including source and drain electrodes is formed on an insulation substrate(400). At the second step, a conductive layer(324) is formed so as to cover the transistor. At the third step, a metal oxidation layer(330) is formed by performing thermal process on the conductive layer in an oxidation atmosphere. At the forth step, a connection wiring between the source and the drain electrodes is formed on the metal oxidation layer(330). The conductive layer is formed by using a metal such as indium, titanium, and a zinc. The metal oxidation layer(330) is further made of TiO, InO, and ZnO. The thermal process is performed under the temperature below 300°C |
