发明名称 THIN FILM FORMING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To realize down-sizing and improve the efficiency of a doping chamber. SOLUTION: This device is provided with a doping chamber 1 to form a p layer as well as an n layer, an i chamber 3 to form an i layer, and a transfer chamber 4 provided with transfer arms 12 and 13 for shipping in/out a substrate 2 to/from the chambers 1 and 3. While the i layer is formed on the substrate 2 in the i chamber 3, the p layer is formed on another substrate 2 in the doping chamber 1 and further the n layer is formed on the other substrate 2 therein.</p>
申请公布号 JP2000195804(A) 申请公布日期 2000.07.14
申请号 JP19980370193 申请日期 1998.12.25
申请人 SANYO ELECTRIC CO LTD 发明人 TERAKAWA AKIRA;TERADA NORIHIRO;YADA SHIGERO
分类号 H01L31/04;C23C16/44;H01L21/205;H01L21/68;(IPC1-7):H01L21/205 主分类号 H01L31/04
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