| 摘要 |
PROBLEM TO BE SOLVED: To inspect the existence of defects of a semiconductor circuit pattern at a high speed. SOLUTION: A plurality of patterns of plural pattern forming members 3-0, 1, n mounted on a base 1 are each simultaneously irradiated with a laser light. A plurality of real images of the plural patterns are superimposed by setting a phase difference. On the basis of photodetecting intensity of a pixel unit, defect to a standard pattern is decided at high speed. For a part having pattern defects, only the coordinate values are calculated, by a computer 14. For a part having no pattern defects, calculation is practically not performed. As a result, decision is accelerated, and conformity or nonconformity of images is also decided instantaneously.
|
