HORIZONTAL LOW PRESSURE CHEMICAL VAPOR DEPOSITING APPARATUS WITHOUT DEPLETION EFFECT

摘要

PURPOSE: A horizontal low pressure chemical vapor depositing apparatus of a semiconductor device is provided to deposit a uniform thickness thin film on a semiconductor substrate by removing the depletion effect. CONSTITUTION: A horizontal low pressure chemical vapor depositing apparatus comprises a wafer boat(21) in which a plurality of semiconductor wafers(33) are vertically loaded. The wafer boat(21) is surrounded by an inner tube(43). The inner tube(43) is surrounded by an outer tube(53). A heater(25) for generating heat is provided to surround the outer tube(53). A first gas inlet(27) is positioned at a first terminal end of an active furnace. A second gas inlet(37) is positioned at a second terminal end of the active furnace which is opposite to the first terminal end(27).