发明名称 MASK PLOTTING DATA GENERATING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To prevent mask accuracy from being adversely influenced even when plotting a fine pattern by correction of an optical proximate effect by simplifying a graphic included in data over a range with an allowable dimensional error for the pattern. SOLUTION: A graphic group (a) is simplified. As a result (b) obtained by resolving the graphic group (a) to counterclockwise oriented line segments, the line segments 3, 7, 10, 14, 20, 24, 26, 28 and 30 which are not axially parallel are so short that they are replaced with the axial parallel pattern for simplification. In the case of the line segment 20, an angle formed by the line segments 19 and 21 connected to the line segment 20 is 90 deg.. In such a case, the intersection of the line segments 19 and 20 is set as a new apex. In the case of the line segment 14, two line segments connected to the line segment 14 are in parallel with the X-axis, so that the apex of the coordinates of a start point and an end point (x1, y1) and (x2, y2) is eliminated and the apex of ((x1+x2)/2 y1) and ((x1+x2)/2 y2) is newly added. The same processing is performed to the other diagonal lines (c).</p>
申请公布号 JP2000187314(A) 申请公布日期 2000.07.04
申请号 JP19980364131 申请日期 1998.12.22
申请人 TOSHIBA CORP 发明人 YAMAMOTO KAZUKO;KAMIKUBO TAKASHI;ABE TAKAYUKI;KOBAYASHI SACHIKO;HARA SHIGEHIRO;HIGURE HITOSHI;UNO TAIGA
分类号 G03F1/36;G03F1/68;(IPC1-7):G03F1/08 主分类号 G03F1/36
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