| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a quartz glass jig which is provided with an oxide film formed on the surface of a quartz glass jig by a CVD process or the like, and in the oxide film of which microcracks are inhibited from being caused even after washing the oxide film several, and accordingly, which enables prevention of contamination of a semiconductor product, due to formation of particles, from being caused. SOLUTION: This quartz glass jig has in the surface, such large recessed and projecting parts as to have a 2-30μm center line roughness (Ra) value, a 10-150μm maximum height (Rmax) and a 10-500μm width. The production process of the quartz glass jig comprises forming an inorganic thin film (such as oxide film) on the surface of a quartz glass jig, which surface has fine recessed and projecting parts and no microcracks, and thereafter, washing the formed thin film several times.</p> |
