发明名称 |
METHOD AND APPARATUS FOR CONTROLLING VACUUM FOR SEMICONDUCTOR ION INJECTOR |
摘要 |
PURPOSE: A vacuum controlling apparatus is provided which can prevent the defect of a turbo pump according to the fuzzy gas inflow during the operation of the turbo pump. A method for controlling vacuum of an ion injector can control effectively the inflow of the fuzzy gas and the operation of the turbo pump. CONSTITUTION: A vacuum controlling apparatus of an ion injector comprises: a turbo pump(2) which is connected to a source chamber(10) of the ion injector and has a number of blades(22) pumping fluid in the source chamber; a gas line(30) which injects a fuzzy gas into the source chamber of the ion injector and has a valve(40) controlling the inflow of the fuzzy gas; and a control part(80) controlling the turbo pump and the valve of the gas line. A rotation detecting part(21) detecting the rotation of the blade is prepared in the turbo pump, and the control part comprises a blade operation detecting part judging the rotation and stopping state of the blade of the turbo pump according to a signal from the rotation detecting part. The control part controls the valve according to a signal judging whether the blade is stopped from the blade operation detecting part.
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申请公布号 |
KR20000032545(A) |
申请公布日期 |
2000.06.15 |
申请号 |
KR19980049036 |
申请日期 |
1998.11.16 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, SUNG JOO;KIM, CHANG JIN;OH, YONG SEUB;CHOI, CHAN SUNG |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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