发明名称 SEMICONDUCTOR LASER AND ITS MANUFACTURING METHOD
摘要 PURPOSE: A semiconductor laser and a method for manufacturing the same are provided to allow ease control of a longitudinal mode, improve the light emitting efficiency and astigmatism, and avoid diffusion of impurities due to grown active layer after a thermal etching process using As. CONSTITUTION: A semiconductor laser includes a substrate(1) made of n-GaAs, etc., a lower buffer layer(2) made of n-GaAs, etc., the first spacer(3) made of n-InGaP, etc., the first lower clad layer(4) made of n-AlGaAs, etc., the second spacer(5) made of n-InGaP, etc., the second lower clad layer(6) made of n-AlGaIn, etc., an active layer(7) made of GaInP, etc., an upper clad layer(8) made of p-AlGaInP, etc., an upper buffer layer(9) made of p-InGaP, etc., and a cap layer(10) made of p+/-GaAs, etc. The first lower clad layer(AlX Ga1-x(x=0.7))(4) and the second lower clad layer(AlGaInP)(6) constitute a dual-clad layer and form a ridge stripe. Thus, leakage of current can be prevented and optical efficiency can be improved.
申请公布号 KR100259002(B1) 申请公布日期 2000.06.15
申请号 KR19930019465 申请日期 1993.09.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JEONG-RYEOL
分类号 H01S5/30;(IPC1-7):H01S5/30 主分类号 H01S5/30
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