METHOD FOR REGULATING IMAGE AND STRUCTURE OF APERTURE PLATE IN SEMICONDUCTOR EXPOSURE EQUIPMENT

摘要

PURPOSE: A method for regulating an image and a structure of an aperture plate are provided to acquire a constant exposure rate even though pattern apertures are not same, and to acquire a constant strength from Diffraction light of low and high orders. CONSTITUTION: A crystal plate is installed in projection lenses between a mask and a wafer. A full blocking film of a circular shape is attached at an edge of the crystal plate. A half blocking film is attached at center of the crystal plate, so that an incidence hole of a circular shape is prepared at an inner side of the full blocking film. Diffraction light is generated from a mask pattern. Differection light of low order passes through the half blocking film. Differection light of high order passes through the incidence hole.