| 摘要 |
PROBLEM TO BE SOLVED: To form a film of ITO or the like with high productivity by observing discharge by an optical system provided on a film forming chamber in a sputtering device provided with an exhaust system and a high pressure power source and detecting abnormal discharge from the change of the distribution of the detected two-dimensional luminance. SOLUTION: In a film forming chamber 2 provided with an exhauster 3, a target holder 5 provided with a magnet 7 provided with a magnet moving device 8 on the back part is arranged, d.c. or high frequency voltage is applied from a high pressure power source 10, and gas introduced from a discharge gas feeding device 4 is made into plasma. The particles in this plasma are accelerated and are collided against a target 6 on the holder 5, and the generated sputtering particles are deposited on a substrate 9 on a holder 11 to form a thin film. The film forming chamber 2 is provided with an opening part 12, and the emission of the plasma is photographed by a CCD camera 13. The image is stored into a memory 14. The former image is compared with a new image by a comparator 15, and the detection of abnormal discharge is executed.
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