Aqueous solution for cleaning a semiconductor substrate

摘要

Aqueous solutions for cleaning semiconductor substrates are formed primarily of a base, hydrogen peroxide and a complexing agent. The complexing agent is a heterocyclic hydrocarbon having a ring size of at least 9 and at most 18 atoms and at least 3 heteroatoms, for example nitrogen, oxygen or sulfur. In the case of nitrogen-containing cryptands, these may additionally be formed with functional reactive groups and/or aliphatic bridges between the nitrogen atoms (cage structures).