| 摘要 |
<p>A pattern formed by magnifying a transfer pattern is divided into patterns (Pi) of master reticles (Ri), and images formed by demagnifying the patterns (Pi) by means of a projection optical system are projection-exposed one by one onto the surface of a blank (mask substrate) while stitching together the patterns. Marks (M1, M2) indicating information which includes identification information for distinguishing the master reticles from other master reticles and information on transfer positions are formed on each of the master reticles (Ri) and detected before the exposure. The exposure is performed according to the reticle information (exposure conditions and correction values) concerning the master reticles and stored in correspondence with the information on transfer positions and the identification information. The man-hour required to manufacture a working reticle by means of the master reticles is small and misoperation is prevented.</p> |
