发明名称 ELECTROSTATIC CHUCK
摘要 An electrostatic chuck for attracting an object to be treated, includes a substrate(1), an insulating dielectric layer (4) and at least one electrode (9) provided between the substrate and the insulating dielectric layer, wherein the above object is to be attracted onto the electrode via the insulating dielectric layer and an average thickness of the insulating dielectric layer (4) is not less than 0.5 mm and not more than 5.0 mm. <IMAGE>
申请公布号 KR100256995(B1) 申请公布日期 2000.05.15
申请号 KR19960038429 申请日期 1996.09.05
申请人 NGK INSULATORS, LTD. 发明人 NAOHITO, YAMADA;MASASHI, ONO;YOUSUKE, USHIKOSHI
分类号 B23Q3/15;G03F7/20;H01L21/302;H01L21/3065;H01L21/683;H02N13/00;(IPC1-7):H01L21/68 主分类号 B23Q3/15
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