METHOD FOR MANUFACTURING THIN FLIM ACTUATED MIRROR ARRAY

摘要

PURPOSE: A thin-film micromirror array-actuated(TMA) manufacturing method prevents the permeation of a hydrogen fluoride(HF) vapor towards an active matrix through an etch passivation layer during the etching process of a sacrificial layer. CONSTITUTION: A protruded portion of convex shape is exposed in a portion(165) to be Iso-Cut among the first layer(124) by patterning the thick first layer(124). The Iso-Cut portion(165) for separating the respective pixels is formed in a bottom electrode(129). The first layer(124) under the Iso-Cut portion(165) is protruded thickly. Even when the portion of the first layer(124) is etched during the patterning of thin films of an actuator, the residual first layer(124) protects an etch passivation layer(115). Therefore, it is possible to prevent the permeation of a hydrogen fluoride(HF) vapor towards an active matrix through the etch passivation layer(115) during the etching process of a sacrificial layer(120).