| 摘要 |
PROBLEM TO BE SOLVED: To enhance positioning accuracy by a method, wherein a component within a region to be processed in a typical region is measured, and this measured values are statistically processed, thereby estimating error components within the region to be processed in each process region to correct it. SOLUTION: From a measurement position offset amount in each measurement shot measured (a region to be processed), errors within the shot of each measurement shot and a shift amount are calculated by statistical calculation, and from an error within the shot of each measurement shot and the shift amount, an error component within shots of each shot and a shift amount are calculated through statistical calculation (A5). Next, each shot is exposed by a step-and-repeat system. At this time, the error components within shots calculated previously and the shift amount are corrected in combination of correcting means prior to the exposure to lights in each shot, and a wafer is positioned relative to a reticle (A6). |
