发明名称 GAP DETECTION SYSTEM
摘要 PROBLEM TO BE SOLVED: To detect a gap at any position between pixel electrodes regardless of presence of absence of an inside structure by projecting reflected slit light in each inside surface of a liquid crystal cell to measure distance between project patterns. SOLUTION: A lighting system 2 converts an outgoing beam of a semiconductor laser 21 into slit light and projects it to a liquid crystal cell 1 at a predetermined angle. A detection system 3 forms reflected light on each boundary face to an image with a detection lens 31, and a CCD light-receiving device 32 receives it. In this case, slit light having penetrated a part with absence of an inside structure of the cell 1, is not divided and becomes a continuous shape, but in presence of the structure, linear slit light is divided and becomes island- like slit light. An image processing device 4 extracts a project pattern by reflected slit light on each surface by projecting a detection image of the device 32 in a longitudinal direction of a slit and measures distance between project patterns. Thereby, a gap between pixel electrodes 12, 15 can be detected even if an optical constant of an inside structure is unknown.
申请公布号 JP2000121326(A) 申请公布日期 2000.04.28
申请号 JP19980298143 申请日期 1998.10.20
申请人 HITACHI ELECTRONICS ENG CO LTD 发明人 MORIGUCHI YASUYUKI;AIKO KENJI
分类号 G01B11/14;(IPC1-7):G01B11/14 主分类号 G01B11/14
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