| 摘要 |
PURPOSE: A methode for washing a substrate and a substrate washing solution are provided to realize an excellent washing effect by containing a first complex and a surfactant in a washing solution. CONSTITUTION: A methode for washing a substrate comprises the steps of: washing a substrate by a first washing solution comprising an ammonia solution or an electrolytic cathode solution; washing the substrate by a second washing solution comprising an oxide of a metal included in an oxide of metal material or a polishing solution, a first complex(a), and an anion based or a cation base surfactant(b). The first complex material is formed with a carboxyl group and a carboxyl base. The second washing solution contains remaining metal impurities on the surface and a second complex after performing a chemical and mechanical polishing processing.
|
