发明名称 MULTI-LAYERED WIRE STRUCTURE AND METHOD FOR FABRICATING THE SAME
摘要 PURPOSE: A multi-layered wire structure and a method for fabricating thereof are provided to improve the reliability of connection between a filling layer and a wire layer of a multi-layered wire structure, without a process such as polishing deteriorating the yield of a product. CONSTITUTION: A multi-layered wire structure includes a bottom wire layer(103a), an intermediate insulation layer, a filling layer(106,112), a top wire layer(109a) and a plated layer(113). The bottom wired layer is formed on a lead frame through an insulation layer. The intermediate insulation layer is formed on the bottom wire layer and has a via hole in a fixed region so as to reveal a top part of the bottom wire layer. The filling layer is made of a conductive material and the via hole fills with the conductive material. The top wire layer is formed on the intermediate insulation layer and has an opening unit on a top part of the region where the via hole is formed. The plated layer is formed on the top wire layer and is connected to the filling layer.
申请公布号 KR20000023423(A) 申请公布日期 2000.04.25
申请号 KR19990041126 申请日期 1999.09.22
申请人 NEC CORPORATION 发明人 HIRASAWA, KOKI;ONO, TERUO
分类号 H01L21/48;H01L23/12;H01L23/498;H01L23/538;H05K1/05;H05K3/42;H05K3/44;H05K3/46;(IPC1-7):H01L23/12 主分类号 H01L21/48
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