Mask holder with clamps on disc-shaped frame for exposure of semiconductor wafers in ion lithography

摘要

The mask (3) is weld by clamps (2) on a disc-shaped frame (1). The clamps are held on the frame via levers (5,6,2) enabling their relative motion w.r.t. the frame. In the latter plane, the levers are formed from it by incisions (8), while the lever joints (9-13) are formed by narrow interruptions of the incisions. Preferably at least three positioning levers (5) are provided, each coupled by the first joint (9) to a clamp and to the frame by a second joint (10), with the positioning levers enabling the clamp motion in radial direction.