| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type photosensitive composition having high sensitivity and resolving power to far UV, particularly ArF excimer laser light and also having suitability to a standard developer by incorporating a specified polymer. SOLUTION: The photosensitive composition contains a polymer which has structural units of formula I and/or formula II and is decomposed by the action of an acid, a compound which generates the acid when irradiated with active light or radiation and a solvent. In the formulae I and II, R1 and R2 are each H, hydroxyl, halogen, alkyl, alkoxy, an alkali-soluble group or an acid decomposable group, the alkali-soluble group is preferably a group having carboxyl and the acid decomposable group is, e.g. a group of the formula -(O-R)n-COOR3 (where R is preferably 1-4C alkylene and R3 may be tertiary alkyl such as t-butyl or t-amyl). |
