发明名称 |
THICKNESS CHANGE MEASURING METHOD AND DEVICE OF PHOTOSENSITIVE LAYER USING CAPACITANCE MEASUREMENT |
摘要 |
PURPOSE: A thickness change measuring device of a photosensitive layer is provided to prevent coating defect of the photosensitive layer by measuring thickness change of the photosensitive layer in each position. CONSTITUTION: A thickness change measuring device of a photosensitive layer comprises a first electrode where a wafer coated by a photosensitive layer is mounted upon one side thereof, a second electrode which is opposite to the photosensitive layer and has a distance to the first electrode, a power supply coupled to the first and the second electrodes, and a current measurer located between the first and the second electrodes.
|
申请公布号 |
KR20000019137(A) |
申请公布日期 |
2000.04.06 |
申请号 |
KR19980037088 |
申请日期 |
1998.09.09 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD. |
发明人 |
LEE, SEONG GU;YANG, SEONG UH |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|