发明名称 THICKNESS CHANGE MEASURING METHOD AND DEVICE OF PHOTOSENSITIVE LAYER USING CAPACITANCE MEASUREMENT
摘要 PURPOSE: A thickness change measuring device of a photosensitive layer is provided to prevent coating defect of the photosensitive layer by measuring thickness change of the photosensitive layer in each position. CONSTITUTION: A thickness change measuring device of a photosensitive layer comprises a first electrode where a wafer coated by a photosensitive layer is mounted upon one side thereof, a second electrode which is opposite to the photosensitive layer and has a distance to the first electrode, a power supply coupled to the first and the second electrodes, and a current measurer located between the first and the second electrodes.
申请公布号 KR20000019137(A) 申请公布日期 2000.04.06
申请号 KR19980037088 申请日期 1998.09.09
申请人 HYUNDAI ELECTRONICS IND. CO., LTD. 发明人 LEE, SEONG GU;YANG, SEONG UH
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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