SUBSTRATE TREATMENT AND SUBSTRATE TREATING DEVICE AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To maintain superposition accuracy even if an error is included in the reference mark positions of reference members. SOLUTION: A substrate 5 is treated by using a treating optical system 4 which is capable of detecting the first reference mark of the first reference mark and second reference mark disposed at a stage 6 for holding the substrate 5 and executing a prescribed treatment to the substrate 5 and alignment optical systems 12a to 12d which are capable of detecting the second reference mark and detect the position of the substrate 5. The method includes a step of detecting a base line quantity which is the spacing between the treating optical system 4 and the alignment optical systems 12a to 12d by using the first reference mark and the second reference mark and a step of correcting the base line quantity detected in accordance with the relative position error of the first reference mark and the second reference mark.