发明名称 APPARATUS AND METHOD FOR MEASURING THICKNESS OF THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a film-thickness measuring apparatus for thin films and its method for measuring and controlling the thickness of a film formed on a board by real time. SOLUTION: This is a film-thickness measuring apparatus 10 for thin films to be used in an apparatus which arranges a board on a rotary drum 8 and forms a thin film on the board, and it is provided with a sheet of measuring glass arranged on the board, a shaft 2 for the rotary drum 8 being a hollow shaft, total reflection mirrors 3, 4 arranged inside the shaft 2 and on an axial extension of this shaft 2 respectively, a light source 5 which irradiates the total reflection mirror 4 arranged on the extension of the shaft through a half mirror 6, and a photodetector 7 which receives light from the total reflection mirror 4 arranged on the extension line of the shaft through the half mirror 6.
申请公布号 JP2000088531(A) 申请公布日期 2000.03.31
申请号 JP19980276404 申请日期 1998.09.14
申请人 SHINCRON:KK 发明人 ZAISHO SHINICHIRO
分类号 G01B11/06;(IPC1-7):G01B11/06 主分类号 G01B11/06
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