发明名称 RESIST PROCESSING DEVICE AND MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To accurately measure a temperature of a substrate heated in a heating part by a dummy substrate having a thermal sensor. SOLUTION: A measuring pin 50 is provided in a lid 48 of a chilling hot plate 41 having a heating part 43. This pin 50 does not come into contact with a wafer W when heating the wafer W as a process substrate. When heating a dummy substrate having a thermocouple, the pin 50 comes into contact with an output terminal provided in the dummy substrate. After being processed by a process part 51, measuring results are displayed in a display part 52.
申请公布号 JP2000091183(A) 申请公布日期 2000.03.31
申请号 JP19990255628 申请日期 1999.09.09
申请人 TOKYO ELECTRON LTD 发明人 UEDA TATSUJI
分类号 H01L21/027;H01L21/00;(IPC1-7):H01L21/027 主分类号 H01L21/027
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