发明名称 |
METHOD FOR MANUFACTURING A NONLINEAR OPTICAL THIN FILM |
摘要 |
A method for manufacturing a nonlinear optical thin film of a silica glass system with sufficient nonlinear optical characteristics, in which a glass substrate 12 is disposed within a vacuum deposition chamber 10 and an electron beam is applied to a SiO2-GeO2-system glass placed on a hearth liner 14 to form a SiO2-GeO2-system thin film on the surface of the substrate 12. In an application of this method, ions of argon, for example, are emitted from an ion source to produce dipoles in the deposited SiO2-GeO2-system thin film. By applying an electric field to the SiO2-GeO2-system thin film thus formed, the dipoles are oriented to let the thin film exhibit nonlinear optical characteristics.
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申请公布号 |
CA2281265(A1) |
申请公布日期 |
2000.03.22 |
申请号 |
CA19992281265 |
申请日期 |
1999.08.31 |
申请人 |
TOYOTA JIDOSHA KABUSHIKI KAISHA |
发明人 |
NAKAMURA, NAOKI;NAKAYAMA, HIDEKI;HASEGAWA, HIROSHI;MURATA, KIYOHITO |
分类号 |
G02F1/355;(IPC1-7):C23C14/10 |
主分类号 |
G02F1/355 |
代理机构 |
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地址 |
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