| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition capable of giving a pattern in which a change in the line width is low, while maintaining high sensitivity even when a recycled developing solution is used. SOLUTION: A resist pattern is formed by using a positive-type resist composition of formula 10<= [b/(a+b)]×100}<=23 and a recycled developing solution, wherein (a) is the amount (parts by weight) of an alkaline-soluble phenol resin, (b) is the amount (parts by weight) of a naphthoquinonediazide sulfonate ester, the alkaline-soluble phenol resin is obtained by the reaction of phenols containing p-cresol in an amount of >=50 wt.% and aldehydes and the naphthoquinonedizaide sulfonate ester is 1, 2-naphthoquinonediazide-5-sulfonate ester of polyhydroxybenzophenone. |
