Measuring system used for micro-characterization of the near-surface region of the solid samples has an integral electron filter between the sample and detector

摘要

An integral electron filter (4) is arranged between the solid sample (1) and the detector (3) in the strip region. A bias voltage negative to the solid sample lying below the beam potential of the electron beam (2) is applied to the electron filter. Measuring system comprises an electron beam probe for irradiating a solid sample, a sample support, a local-sensitive detector for detecting electrons scattered back from the sample, and an electronic evaluator. An integral electron filter (4) is arranged between the solid sample (1) and the detector (3) in the strip region. A bias voltage negative to the solid sample lying below the beam potential of the electron beam (2) is applied to the electron filter.