发明名称 LOW DIELECTRIC POLYMERIC MATERIAL AND FILM SUBSTRATE AND ELECTRONIC PART USING THE SAME
摘要 <p>A low dielectric polymer is obtained by polymerizing a monomeric composition comprising a fumaric acid diester monomer and optionally a vinyl monomer. The polymer having a low dielectric constant and reduced dielectric loss is used as an electrically insulating material in a high frequency band of at least 500 MHz.</p>
申请公布号 KR100248842(B1) 申请公布日期 2000.03.15
申请号 KR19970003602 申请日期 1997.02.05
申请人 TDK CORPORATION 发明人 YAMADA, TTOSHIAKI;TAKAHASHI, TAKESHI;YAKUWA, ATSUSHI;NINOMIYA, HIDEAKI;AMAYA, NAOYUKI;SAITO, NAOKI;IMAYA, YASUHIRO;KAIYA, NORIHIRO
分类号 C08F22/14;C08F22/10;H01B3/44;H05K1/03;(IPC1-7):H01B3/00 主分类号 C08F22/14
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