DEVICE AND METHOD OF INSPECTING PATTERN

摘要

PROBLEM TO BE SOLVED: To prevent the deterioration of quality of image due to the deflection noise while performing the positional correction of an area to be inspected by forming a pattern inspecting device of a main deflecting device for deflecting the electron beam at a high speed in an narrow range and an auxiliary deflecting device for performing the positional correction of the area to be inspected and for deflecting the electron beam at a low speed in a wide range. SOLUTION: Before inspecting a pattern, a sample 11 is scanned by an electron beam 9, and an inspecting device 8 detects an alignment mark on the basis of the secondary electron 12 generated by scanning. A positional correction control computer 20 computes a positional setting error on the basis of the secondary electron 12 and the coordinate value obtained by a laser interferometer 18. After starting the inspection, the position correcting computer 20 controls a stage 10 on the basis of a coordinate of an area point of the inspection obtained by the laser interferometer 18 and a value of the displaced variable of the sample. The position correcting computer 20 also sends the signal to an auxiliary deflection control circuit 25 and a converging device control circuit 22 on the basis of the coordinate of a starting point of the inspection area sent from the laser interferometer 18 and a value of the angle of rotation of the sample so as to control an auxiliary deflecting device 24 and a converging device 5.