发明名称 THIN FILM TRANSISTOR, ITS MANUFACTURE, AND DISPLAY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To obtain a TFT which is large and uniform in a crystal particles size in a polycrystal silicon film which is an active layer and great in laser energy margin, and a display device capable of obtaining a superior display. SOLUTION: A gate electrode 11 composed of chrome, a gate insulated film 12, and an amorphous silicon film 13 are laminated on a glass substrate 10, and a 700Åthick coating film 14 is formed on the amorphous silicon 13 and upwardly of the gate electrode 11. Thereafter, an excimer laser is radiated to polycrystallize, thereby forming a TFT provided with the polycrystal silicon film as an active layer 13.</p>
申请公布号 JP2000058850(A) 申请公布日期 2000.02.25
申请号 JP19980231033 申请日期 1998.08.17
申请人 SANYO ELECTRIC CO LTD 发明人 JINNO MASASHI
分类号 G02F1/136;G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 G02F1/136
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