| 摘要 |
PROBLEM TO BE SOLVED: To obtain a charged particle beam exposure system by which a reticle which is not contaminated by fine particles or the like can be used without reducing performance at all times. SOLUTION: A reticle 100A is sent to a reticle cleaning device 132 without fail, before being transferred from a reticle loader 131 to a position for exposure by reticle transferring devices 120 and 121. After adhered fine particles or the like are removed by the reticle cleaning device 132, the reticle is disposed in a position for exposing. The reticle 100A used for exposure is replaced, after a certain time, with a reticle 100B having same patterns. The reticle 100B to be disposed to a position for exposure has been already transferred from the reticle loader 131 to the cleaning device 132 and has been completed of cleaning, while the reticle 100A is used for exposure. In this way, the reticles 100A and 100B are used alternately at a time interval which is shorter enough than the time, in which fine particles or the like causing problems to projection exposure adhere to the reticle. |
