PLASMA-ENHANCED VACCUM VAPOR DEPOSITION SYSTEMS INCLUDING SYSTEMS FOR EVAPORATION OF A SOLID, PRODUCING AN ELECTRIC ARC DISCHARGE AND MEASURING IONIZATION AND EVAPORATION

摘要

Apparatuses and methods for use in vacuum vapor deposition coating provide for, economical and continuous operation. A system and method for continuous ly melting and evaporating a solid material (7) for forming a coating vapor includes the use of a separate melting crucible (1) and evaporating crucible (13). A system and method for energizing the evaporative solids to form a plasma which includes first and second electrodes and a device for selective ly switching polarity between the first and second electrodes to avoid coating vapor deposition on the electrodes. Another system and method for energizing the evaporative solids to form a plasma which includes an electric arc discharge apparatus with a cathodic and an anodic part. A continuously fed electrode is disclosed for continuous vaporization of electrode members in a n electric arc discharge. An apparatus and method provides for measurement of the rate of evaporation from an evaporator and the degree of ionization in a vapor deposition coating system. Lastly, a system is disclosed for in-situ cleaning of vaporizable deposits for cleaning of the enclosure of the vacuum vapor deposition system.