发明名称 RADIATION SENSITIVE MATERIAL AND PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To enhance the difference between the dissolution speeds of exposed parts and unexposed parts by using a base resin made of a film forming polymer and a photosensitive agent, a specified compound, and a solvent for dissolving them. SOLUTION: This photosensitive composition comprises the base resin made of the film forming polymer and the photosensitive agent and the solvent for dissolving the components and the lactone derived compound represented by the formula in which R1 is a 2-30C atomic group; R2 is an H atom or a hydroxyl, 1-10C alkyl, 1-10C hydroxyalkyl, or 1-10C haloalkyl group; (n) is an integer of 2-8; and (m) is an integer of 1-6. It is preferred that this lactone derived compound is contained in an amount of <50 weight % of the base resin, and the lactone part or the lactone of this compound has the lactone ring opened in an aqueous solution of alkali to be converted into a hydroxyacid.
申请公布号 JP2000035664(A) 申请公布日期 2000.02.02
申请号 JP19990065290 申请日期 1999.03.11
申请人 FUJITSU LTD 发明人 YANO EI;WATABE KEIJI;NAMIKI TAKAHISA;NOZAKI KOJI;OZAWA YOSHIKAZU;KON JUNICHI
分类号 H01L21/027;G03F7/004;G03F7/039;G03F7/32 主分类号 H01L21/027
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