METHOD FOR FORMING SILICA FILM

摘要

PURPOSE: A method for forming silica film is provided to increase uniform formation thickness limit by using coating liquid without problem due to excessive diffusion of dopant into a source layer or a drain layer. CONSTITUTION: The method for forming silica film comprises: (a) a step applying coating liquid containing enhanced polysilazan compound of reactive product between polysilazan compound and dialkylalkanolamine within organic solvent; (b) a step drying the coating layer to form a dried coating layer; (c) the first heat treatment step treating the dried coating layer under 350-450°C for 0.5-60 min; and (d) the second heat treatment step treating the coating after the (c) step under 550-800°C for 0.5-60 min.