| 摘要 |
PURPOSE: A mark for measuring a reiteration error is provided to improve a reliability of a device and production yield thereof. CONSTITUTION: The mark(10) for measuring a reiteration error generated during a lithography process of a semiconductor device comprises: a plurality of patterns(29) consisting of combination of a mother ruler(30) and a child ruler(40). Each pattern consists of one which the mother ruler and the child ruler are combined at least one of box in box, bar in bar, box in bar, and bar in box. The moving child ruler with respect to the mother ruler fixed is aligned with matrix square with the distance of nDELTAx and nDELTAy.
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