| 摘要 |
PROBLEM TO BE SOLVED: To operate double exposure in a short time. SOLUTION: An optical system for interference exposure is set in a projection aligner. This optical system is provided with a pair of small deflecting members 301 and 302 on the pupillary face of a projection optical system 196, and two laser beams are made incident through the pair of deflecting members 301 and 302 to the optical system at a wafer side from the pupillary face of the projection optical system, and the two laser beams are made to interfere on a wafer 198 by this optical system.
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