发明名称 POSITIVE VISIBLE LIGHT SENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a composition containing a photosensitizer excellent in preservation stability and high in sensitivity to laser beams of long wavelength by containing a specific dipyrromethene boron complex as the photosensitizer. SOLUTION: This composition contains a dipyrromethene boron complex expressed by a formula, as a photosensitizer. This photosensitizer is excited by absorbing light in a visible light area of 400-700 nm, particularly 400-600 nm, and interacts with resin and a photo-acid generating agent. In the formula, R1-R7 independently represent hydrogen atom, halogen atom, nitro group, cyano group, hydroxy group, amino group, carboxyl group, sulfonic acid group, alkyl group, halogenoalkyl group, alokoxyalkyl group or the like; R4 represents hydrogen atom, cyano group, alkyl group, aralkyl group, aryl group, heteroaryl group or the like; R8 represents alkyl group, aryl group or aralkyl group; and R9 represents halogen atom, alkoxy group, aryloxy group or the like.
申请公布号 JP2000019738(A) 申请公布日期 2000.01.21
申请号 JP19980191764 申请日期 1998.07.07
申请人 KANSAI PAINT CO LTD;MITSUI CHEMICALS INC 发明人 IMAI GENJI;KOGURE HIDEO;OGISO AKIRA;MISAWA TSUTAYOSHI;NISHIMOTO TAIZO;TSUKAHARA TAKASHI;TAKUMA HIROSUKE
分类号 G03F7/004;C07F5/02;C08F2/50;C09K3/00;G03F7/039;H01L21/027 主分类号 G03F7/004
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