| 摘要 |
An electrostatic chuck 12 for a plasma reactor apparatus 10 comprises a base metallic section 23, a pair of electrodes 24 set in bonding material 27 and electrically insulated from the base by a plate 29 and a thick dielectric layer 20 (e.g. 0.5 to 1.5 mm), which covers the electrodes 24 and bonding material 27 and forms the support surfaces for wafers 31. |
