发明名称 |
Apparatus for the fabrication of tapered structures in semiconductors |
摘要 |
Production process uses a mask (5) that can be displaced in at least one lateral direction above the vertical structure that is to be produced. One or more masks (4,5) can be used above a lacquer layer (3), which is etched using the photolithographic process above the semiconductor structure (1). |
申请公布号 |
EP0973188(A1) |
申请公布日期 |
2000.01.19 |
申请号 |
EP19990250235 |
申请日期 |
1999.07.15 |
申请人 |
HEINRICH-HERTZ-INSTITUT |
发明人 |
KAISER, RONALD;STEINGRUEBER, RALF |
分类号 |
H01L21/027;H01L21/266 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|