| 摘要 |
PURPOSE: A mask frame is fabricated such that an insulation pattern of the same height as an alignment mark is regularly formed in a surplus area of a semiconductor device. CONSTITUTION: The mask frame of a semiconductor device for fabricating a pattern by aligning with an alignment mark and then exposing photosensitive layer of a surface on a semiconductor substrate comprises a plurality of shielding regions arranged in an opening region of the mask frame such that a dummy pad for protecting the alignment mark from excessive chemical mechanical polishing process at post chemical mechanical polishing process. According to the aforementioned mask frame, it is easy to performing the post chemical mechanical polishing process by preventing the alignment mark from being injured at the post chemical mechanical polishing process.
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