| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. excellent in shelf stability and useful for forming a pattern, e.g. in the formation of an electrode on a large-sized glass substrate of PDP or the like and to obtain a photoresist film of the compsn. SOLUTION: The photosensitive resin compsn. contains a base polymer (a) having a wt. average mol.wt. of 40,000-200,000, 30 to <90 pts.wt. ethylenically unsatd. compd. (b) and 0.1-30 pts.wt. photopolymn. initiator (c), based on 100 pts.wt. of the polymer (a), and a hydroxy-fatty acid or its deriv. (d). |
